Project Background and Challenges
Client: A well-known upstream semiconductor material manufacturer in Taiwan.
Project Requirement:
The client needed to grind high-purity electronic-grade ceramic powder for semiconductor packaging and sputtering targets. The target was micron or even submicron-level particle size.
Core Challenges:
- Extremely High Purity Requirements:
Semiconductor materials have an extremely low tolerance for metallic impurities such as Fe and Cr.
Traditional steel-lined ball mills risk severe iron contamination, making them unsuitable for this application. - Fineness and Efficiency:
The system must ensure precise particle fineness while maintaining stable and efficient batch production.

Solution
To meet the customer’s stringent requirements for purity and ultrafine particle size, EPIC POWDER designed a custom ceramic-lined ball mill grinding system.
- Liner Material:
All components that contact the material are made from high-purity, wear-resistant zirconia ceramic. These include the mill cylinder, agitator shaft, and screening parts. This design completely eliminates the risk of Fe or Cr contamination. - Grinding Media:
The system uses high-purity, micron-sized zirconia beads as the grinding media, ensuring no secondary contamination even under long-term high-energy milling. - Precision Classification:
Equipped with frequency control and a high-efficiency classifier, the system achieves a consistent particle size of D97 = 2–5 μm. - Closed System Design:
The entire production line operates in a fully enclosed system, effectively preventing dust dispersion and external contamination.

Project Outcome
This customized solution helped the Taiwanese client overcome the bottleneck in high-purity powder production, significantly improving product consistency and purity.
As a result, the client strengthened its position within the semiconductor upstream material supply chain, achieving both technological and quality advantages.
Material :semiconductor material
Fineness: D97 = 2–5 μm
Output: 1.5-2T /h